Use of related parameters in X-ray diffraction analysis of multilayer structures with allowance for the layer growth time

A new approach to analyzing the X-ray diffraction spectra of multilayer structures is described. This approach is based on information on the layer growth time. As compared to the standard analysis, the number of variable parameters decreases. The stability and rate of convergence of fitting a calculated spectrum to an experimental spectrum increase in the case of a large number of layers and little-information experimental data. The approach is executed by imposing relations on the model parameters during the calculation of spectra using the Bruker DIFFRAC.Leptos software package. A multilayer SiGe/Si structure is used to compare the new approach and the standard procedure of analysis. The correctness of the new approach is supported by a comparison with the experimental data obtained by secondary-ion mass spectrometry and transmission electron microscopy. The advantages and limitations of the proposed method are discussed.