A Large Area Plasma Source Using Multi-cathode Electron Beam

A new plasma source using the multi-cathode electron beam has been designed and manufactured. A multi-cathode was adopted to produce bulk plasmas in a large volume. Multi-cathode electron beam plasma source(MCEBPS) was found to generate stable plasmas over the wafer diameter of 300 mm or above. W(tungsten) filament was used as a cathode. Over a 320 mm diameter, both the plasma potential and floating potential were uniformly maintained and the difference between was measured to be small. The plasma density was around and its variation along the radial distance was small.