Temperature Scalings in the Repute-1 Reversed-Field Pinch Plasma

Statistical property of ion and electron temperatures on various plasma parameters has been investigated in REPUTE-1 reversed field pinch (RFP) plasmas. The scalings laws are expressed in terms of the plasma current, loop voltage and line averaged density. Dependence on other parameters seems to be weak. The operational range of density is wide in REPUTE-1, and it is limited by Hugill number H*similar to 1, which is another expression of I-p/N, where I-p is the plasma current and N is the area density. Obtained scaling laws areT-i proportional to V-Loop 1.3x (n) over bar(e)-0.3, Te proportional to I(p)(0.8)x<(n)(o)ver bar>(e)-0.2where n(e) is the line averaged electron density and V-Loop is the loop voltage. The electron temperature has roughly same dependence as other RFP devices. The I-p dependence of ion temperature is not found in REPUTE-1, while some RFP devices demonstrate linear dependence.