Organic-Inorganic Thin Films from TiCl4and 4-Aminophenol Precursors: A Model Case of ALD/MLD Hybrid-Material Growth? (Eur. J. Inorg. Chem. 6/2014)

The cover picture shows the deposition cycle of a (Ti–O–C6H4–N=)n-type thin film with TiCl4 and 4-aminophenol as precursors. The atomic/molecular layer-by-layer growth process is carried out by employing a combination of the atomic and molecular layer deposition (ALD/MLD) techniques. The combined ALD/MLD technique provides a powerful tool to fabricate organic–inorganic hybrid thin films with versatile structures. Details are discussed in the article by P. Sundberg and M. Karppinen on p. 968 ff. For more on the story behind the cover research, see the Cover Profile.