Effect of Nitrogen Passivation on the Performance of MIM Capacitors With a Crystalline- $\hbox{TiO}_{2}/\hbox{SiO}_{2}$ Stacked Insulator

IEEE Electron Device Letters(2012)

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atomic force microscopy,thin films,nitrogen,capacitors,thermal treatment,leakage current,heat treatment,atomic force microscope,passivation,grain boundary,grain boundaries,crystallisation
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