AES and Related Techniques for Yield Improvement, Metrology and Development Support of ULSI Circuits Manufactured in ≤ 28nm CMOS Technology

Kornelia Dittmar,Susanne Ohsiek,Christoph Klein,Martin Weisheit,Markus Lenski,Elke Erben,Dina H Triyoso,Robert Binder,Joachim Metzger,Klaus Hempel,Hansjurgen Engelmann

Microscopy and Microanalysis（2014）

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ulsi circuits manufactured,aes,cmos,yield improvement

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