Formation of Patterned Sapphire Substrate using UV Imprint Processes

This paper presents a fabrication process of microscale patterned sapphire substrates (PSSs). The resin mold was fabricated precisely by UV roll-to-roll (RtR) imprinting. Pillar pattern were UV-imprinted on a sapphire wafer by using the mold. PSS were formed on the 2-inch and 4-inch entire wafer areas by BCl3-based reactive ion etching. The height and bottom diameter of the conical structure in a 2-inch sapphire wafer were 1.73 mu m and 2.67 mu m, respectively.