NIST high throughput variable kinetic energy hard X-ray photoelectron spectroscopy facility
Journal of Electron Spectroscopy and Related Phenomena(2013)
摘要
•High throughput HAPXES beamline provides beam energies between 2.1 and 6keV.•Recent results in depth profiling of materials for next-generation CMOS.•Facility ideal or measurement of energy level alignment at buried interfaces.•Approved beamline NSLS II will provide wider energy range and X-ray flux.
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关键词
HAXPES,Photoelectron spectroscopy,Synchrotron techniques
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