NIST high throughput variable kinetic energy hard X-ray photoelectron spectroscopy facility

Journal of Electron Spectroscopy and Related Phenomena(2013)

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摘要
•High throughput HAPXES beamline provides beam energies between 2.1 and 6keV.•Recent results in depth profiling of materials for next-generation CMOS.•Facility ideal or measurement of energy level alignment at buried interfaces.•Approved beamline NSLS II will provide wider energy range and X-ray flux.
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关键词
HAXPES,Photoelectron spectroscopy,Synchrotron techniques
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