Magnetic properties of Co–N thin films deposited by reactive sputtering

Co–N thin films with thickness of 80nm were deposited using direct current magnetron sputtering at different N2 partial pressures (PP). The composition, structure and magnetic properties were characterized using Rutherford Backscattering Spectrometry, X-ray Diffraction, Atomic Force Microscopy and Magnetometry. The magnetic properties vary with the nitrogen content of the film, determined by the N2 PP used for deposition, and are correlated with the cobalt content of the film. The magnetic phases Co4+xN and Co3N were identified as responsible for the variation of the magnetization values.