Positive bias temperature instability of irradiated n-channel thin film transistors

Thin Solid Films(2014)

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摘要
Differently processed thin film transistors (TFTs) were exposed to gamma irradiation to the total dose of 1200Gy under positive gate bias and 2500Gy without electrical bias during radiation. Post-irradiation stability was evaluated by positive bias temperature (PBT) test in the temperature range between 100 and 150°C and compared to the positive bias temperature test instability (PBTI) of non-irradiated TFTs. It was found that post-irradiation PBTI is affected by the fabrication conditions of TFTs and the level of damage caused by irradiation.
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关键词
Thin film transistors,Threshold voltage,Drain current,Post-irradiation stability
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