Styryl silsesquioxane photoresist
JOURNAL OF APPLIED POLYMER SCIENCE(2015)
Abstract
There is a substantial need for photopattern-able, heat resistant, and transparent materials that are applicable to electronic devices, such as imaging or display elements. Styryl silsesquioxane based photoresist forms thin micro patterns after i-line exposure and alkaline development, and the resulting transparent film shows remarkable heat resistance. Radicals generated from a photoinitiator induce polymerization of styryl functionality in the photoresist film to form the micropatterns. (C) 2014 Wiley Periodicals, Inc.
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Key words
coatings,photochemistry,photopolymerization,structure-property relations
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