Semiconductor Microcavity Lasers

Pl Gourley,Jr Wendt,Ga Vawter,Me Warren,Tm Brennan,Be Hammons

PHYSICS AND SIMULATION OF OPTOELECTRONIC DEVICES II（1994）

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Abstract

New kinds of semiconductor microcavity lasers are being created by modern semiconductor technologies like molecular beam epitaxy and electron beam lithography. These new microcavities exploit 3D architectures possible with epitaxial layering and surface patterning. The physical properties of these microcavities are intimately related to the geometry imposed on the semiconductor materials. Among these microcavities are surface-emitting structures that have many useful properties for commercial purposes. This paper reviews the basic physics of these microstructured lasers.

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Key words

physics,electron beam lithography,electron beam,semiconductors,molecular beam epitaxy,technology assessment,physical properties,3 dimensional,microstructures,lasers

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