Towards interferometric quantum lithography: observation of spatial quantum interference of the three-photon N00N state

Proceedings of SPIE(2011)

引用 1|浏览5
暂无评分
摘要
Spatial interference of quantum mechanical particles exhibits a fundamental feature of quantum mechanics. A two-mode entangled state of N particles known as N00N state can give rise to non-classical interference. We report the first experimental observation of a three-photon N00N state exhibiting Young's double-slit type spatial quantum interference. Compared to a single-photon state, the three-photon entangled state generates interference fringes that are three times denser. Moreover, its interference visibility of 0.49 +/- 0.09 is well above the limit of 0.1 for spatial super-resolution of classical origin. The demonstration of spatial quantum interference by a N00N state composed of more than two photons represents an important step towards applying quantum entanglement to technologies such as lithography and imaging.
更多
查看译文
关键词
lithography,quantum entanglement,quantum mechanics,super resolution,particles,photons
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要