Euvl Compatible, Ler Solutions Using Functional Block Copolymers

Directed self assembly (DSA) of block copolymers is an emerging technology for achieving sub-lithographic resolution. We investigate the directed self assembly of two systems, polystyrene-block-poly-DL-lactic acid (PS-b-PDLA) and PS-b-poly(methyl methacrylate). For the PS-b-PDLA system we use an open source EUVL resist and a commercially-available underlayer to prepare templates for DSA. We investigate the morphology of the phase separated domains and compare the LER of the resist and the PS-PDLA interface. For the PS-b-PMMA system we again use an open source resist, but the annealing conditions in this case require crosslinking of the resist prior to deposition of the block copolymer. For this system we also investigate the morphology of the phase separated domains and compare the LER of the resist and the PS-PMMA interface.