Combining nanoimprint lithography and a molecular weight selective thermal reflow for the generation of mixed 3D structures
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B(2011)
摘要
Sloped and stepped 3D structures were added to surface-patterned resists using grey-scale electron beam lithography and thermal reflow. A poly(methyl methacrylate) resist with moderate initial molecular weight of 120 kg/mol was chosen, which enabled processing with both nanoimprint and electron beam lithography. Using proper exposure doses, a molecular weight distribution was generated that allowed a selective thermal postprocessing of the exposed steps while the imprinted gratings on top of the resist were preserved. This allows fabricating mixed structures of microprisms surrounded by large-area nanogratings in the same resist layer. Working stamps were casted from the template pattern and subsequently replicated using thermal nanoimprint. As a possible application, backlight devices with arrays of light outcoupling prisms can be seen. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3643761]
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关键词
electron beam lithography,nanolithography,nanopatterning,polymers,resists,soft lithography
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