High-Speed Operation Of The Heterostructure Field-Effect Optical Modulator

Ta Vang, Pa Evaldsson, Pa Kiely,Gw Taylor,Pw Cooke

ADVANCED PHOTONICS MATERIALS FOR INFORMATION TECHNOLOGY(1994)

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Abstract
The Heterostructure Field Effect Optical Modulator (HFEOM) is a waveguide modulator that operates via band filling of quantum wells using charge transfer from an adjacent n+ charge sheet. The control of this charge transfer is with a gate electrode as in a field effect transistor. The band filling of the quantum wells produces a blue-shift of the absorption edge that is used to modulate the incident light. This device is compatible in both growth and processing with the associated in- plane laser and field effect transistor. The initial high speed results of HFEOMs in the InGaAs/GaAs material system are presented using a double quantum well active region. This structure has demonstrated a 35:1 extinction ratio for a 2 volt swing (-1 V to +1 V) on a 300 micrometers long device along with excellent wavelength compatibility with a 400 micrometers in-plane laser fabricated from the same wafer. Capacitance limited modulation bandwidths of 1.2 GHz and 1.6 GHz are measured for 5 micrometers and 2 micrometers rib widths respectively.
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Key words
extinction ratio,field effect transistors,absorption,optical modulator,capacitance,lasers,modulation,quantum wells,gallium arsenide,electrodes,field effect transistor,optical modulators,waveguides,quantum well,charge transfer
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