Hotspot monitoring system with contour-based metrology
Proceedings of SPIE(2009)
摘要
As design rules shrink, hotspot management is becoming increasingly important. In this paper, an automatic system of
hotspot monitoring that is the final step in the hotspot management flow is proposed. The key technology for the
automatic hotspot monitoring is contour-based metrology. It is an effective method of evaluating complex patterns, such
as hotspots, whose efficiency has been proved in the field of optical proximity correction (OPC) calibration. The
contour-based metrology is utilized in our system as a process control tool available on mass-production lines.
The pattern evaluation methodology has been developed in order to achieve high sensitivity. Lithography simulation
decides a hotspot to be monitored and furthermore indicates the most sensitive points in the field of view (FOV) of a
hotspot image. And quantification of the most sensitive points is consistent with an engineer's visual check of a shape of
a hotspot. Its validity has been demonstrated in process window determination. This system has the potential to
substantially shorten turnaround time (TAT) for hotspot monitoring.
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关键词
calibration,design rules,field of view,mass production,process control,lithography,metrology,optical proximity correction
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