Depth Profile Analysis Of New Materials In Hollow Cathode Discharge

R Djulgerova,V Mihailov,V Gencheva, L Popova, B Panchev, V Michaylova, A Szytula, L Gondek,T Dohnalik, Zl Petrovic

PHYSICS OF IONIZED GASES（2004）

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摘要

In this review the possibility of hollow cathode discharge for depth profile analysis is demonstrated for several new materials: planar optical waveguides fabricated by Ag+-Na+ ion exchange process in glasses, SnO2 thin films for gas sensors modified by hexamethildisilazane after rapid thermal annealing, W- and WC- CVD layers deposited on Co-metalloceramics and WO3- CVD thin films deposited on glass. The results are compared with different standard techniques.

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关键词

ion implantation,optical waveguide,thin film,electron beam,ion exchange,thin film deposition

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