Chromatic Aberration-eliminated Optical System of 3ωTarget Alignment Laser for SG-III Prototype Facility

Keyu Li,Zhan Sui,Huaiting Jia,Bin Feng,Yong Xiang,Fuquan Li,Chi Ma,Xiaofeng Wei

International Optical Design（2006）

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摘要

To realize multi-beam positions and crystals alignment, the 3ω target alignment laser of SG-III Prototype Facility has been designed as a reflection optical system, which avoids the effect of chromatic aberration.

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关键词

alignment laser,optical system,aberration-eliminated,sg-iii

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