Growth and Characterization of In-Based Nitride Compounds and their Double Heterostructures

We report on the growth and characterization of InGaN bulk films and AlGaN/InGaN/AlGaN double heterostructures (DHs). Good quality bulk InGaN films have been grown by metalorganic chemical vapor deposition (MOCVD) with up to 40% InN as characterized by x-ray diffraction. The effect of hydrogen in the growth ambient on the lnN% incorporation in the InGaN films is presented. Photoluminescence (PL) spectra of AlGaN/InGaN/AlGaN DHs exhibit emission wavelengths from the violet through yellow depending on the growth conditions of the active InGaN layer. The PL spectra are fairly broad both at room temperature and 20 K, and could be a result of native defects or impurity related transitions. We also observed a linear dependence between the PL intensity and excitation power density in the 0.001 W/cm 2 to 10 MW/cm 2 range. Time resolved PL of one of these DHs suggest a recombination lifetime on the order of 520 ps.