Pattern Matching For Identifying And Resolving Non-Decomposition-Friendly Designs For Double Patterning Technology (Dpt)
DESIGN FOR MANUFACTURABILITY THROUGH DESIGN-PROCESS INTEGRATION VII(2013)
摘要
A pattern matching methodology that identifies non-decomposition-friendly designs and provides localized guidance for layout-fixing is presented for double patterning lithography. This methodology uses a library of patterns in which each pattern has been pre-characterized as impossible-to-decompose and annotated with a design rule for guiding the layout fixes. A pattern matching engine identifies these problematic patterns in design, which allows the layout designers to anticipate and prevent decomposition errors, prior to layout decomposition. The methodology has been demonstrated on a 180 um(2) layout migrated from the previous 28nm technology node for the metal 1 layer. Using a small library of just 18 patterns, the pattern matching engine identified 119 out of 400 decomposition errors, which constituted coverage of 29.8%.
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关键词
Pattern matching,odd-cycles,coloring conflicts,double patterning,decomposition,design flow,design rule,DRC Plus,automated decomposition algorithm,DPT
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