PR Coating for Electron Beam Lithography of Cylindrical Mold and Measuring Coating Thickness of It using Measuring Tip

Seungwoo Lee, Jeongo Kim,Jeong Dae Suh

Journal of the Korean Society of Precision Engineering(2012)

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Abstract
Process conditions for generating nano patterns handle different process according to the pattern characteristics, and different process data according to patterns in questions. To efficiently find optimal process conditions for generating nano patterns, process data by experiment is needed consideration of the pattern characteristics concerning the equipment. In particular, coating methods of a cylindrical mold differ from it of a flat plate because of viscosity of coating materials. Also the coating thickness affects nano process and pattern line width. So coating method of coating thickness for cylindrical mold is very important on nano pattern generating. In this study, a method is proposed for coating Photo Resist through the spray in order to coat cylindrical mold and measuring the thickness of coating using measuring tip considering the size of cylindrical mold because there is no method in the existing SEM. The proposed method is applied to a real printed electronics system to verify its accuracy and efficiency.
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Key words
photo resist,electron beam lithography
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