Multilayer thin film metallic glasses under nanoscratch: Deformation and failure characteristics

A nanoscratch technique to investigate the deformation and failure characteristics of multilayer thin film metallic glasses (TFMGs) is described. Nanoscratch experiments were performed on Zr-based multilayer (bilayer) TFMGs deposited over hard substrates (Si, soda-lime glass). Layer pattern and modulation ratio greatly influence the thin films failures under nanoscratch. When compared with pattern (layer-1 / layer-2) = (Zr65 / Zr55), multilayer TFMGs with layer pattern = (Zr55 / Zr65) shows better tribological performances regardless of substrate type (Si or SLG) under the considered nanoscratch conditions. This study is beneficial to find appropriate combination of layer pattern and modulation ratio to ensure good adhesion between multilayer TFMG and substrate.