Automated Layout Of Mask Assist-Features For Realizing 0.5k1 Asic Lithography

The virtues of mask-plane assist features for improving imaging performance of generic ASIC layouts in the 0.5k1 realm has been previously proclaimed. In this report we provide experimental verification and introduce a methodology to automatically deploy these features on ASIC layouts.© (1995) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.