Nodular defect planarization for improved multilayer mirror laser resistance

Christopher J Stolz, Justin E Wolfe,Paul B Mirkarimi,James A Folta, John A Adams, Marlon G Menor,Nick E Teslich,Regina Soufli,C S Menoni,Dinesh V Patel

Optical Interference Coatings (2013), paper FA.1（2013）

引用 2|浏览19

暂无评分

摘要

Planarizing nodular defects with angle-dependent ion etching and uniform deposition increased the 1064 nm laser resistance of optical interference mirror coatings by greater than 20×.

查看译文

关键词

thin films

AI 理解论文

溯源树

样例

生成溯源树，研究论文发展脉络

Chat Paper

正在生成论文摘要