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Analysis of Distinct Scattering of Extreme Ultraviolet Phase and Amplitude Multilayer Defects with an Actinic Dark-Field Microscope

Lukas Bahrenberg,Stefan Herbert,Jenny Tempeler,Aleksey Maryasov,Oskar Hofmann,Serhiy Danylyuk,Rainer Lebert,Peter Loosen,Larissa Juschkin

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VI（2015）

Cited 2|Views7
Key words
phase defect,amplitude defect,EUV lithography,actinic,dark-field microscopy,mask blank inspection
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