Mocvd Optimized Growth For Laser Diodes Emitting At 980nm Via Photoluminescence

We have investigated different growth conditions of AlGaAs and InGaAs quantum wells (QWs) by metal organic chemical vapor deposition (MOCVD) for applications in high-power laser diodes emitting at 980nm. According to different experimental results measured by Photoluminescence (PL), we optimized the growth conditions. Growth temperature, V/III ratio, growth interruption and spacer time have been studied in detail.We have found the optimal growth conditions for laser diodes emitting at 980nm grown by metal organic chemical vapor deposition (MOCVD). As for our experiments, the best suitable growth temperature of AlGaAs and InGaAs QWs was 700 degrees C and 600 degrees C, respectively. The growth procedure of laser diodes should include growth interruption and spacer layers surrounding QWs. V/III ratio was about 130 during the growth of QWs.