Nanoimprint Activities In Austria In The Research Project Cluster Nilaustria

Michael Muehlberger, Hannes Fachberger,Iris Bergmair,Michael Rohn,Bernd Dittert,Rainer Schoeftner, Thomas Rothlaender,Dieter Nees,Ursula Palfinger,Anja Haase,Alexander Fian, Martin Knapp,Claudia Preininger,Gerald Kreindl,Michael Kast,Thomas Fromherz

28TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE（2012）

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摘要

The NILaustria research project cluster consists of 8 individual research projects and aims to improve nanoimprint lithography in an application driven approach. The cluster is presented as well as highlights from the projects, e. g. the replication of 12.5nm half pitch features using working stamp copies, topics from organic electronics, metamaterials and SiGe technology. An outlook on the new activities is given.

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关键词

Nanoimprint lithography,UV-NIL,hot embossing

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