A 70nm NOR flash technology with 0.049 /spl mu/m/sup 2/ cell size

Chankwang Park,Sangpil Sim,Jungin Han,Chul Jeong,Younggoan Jang,Junghwan Park, Jaehoon Kim,Kyucharn Park,Kinam Kim

symposium on vlsi technology（2004）

Cited 6|Views3

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Abstract

A 70nm NOR flash technology has been for the first time developed with a cell size of 0.0494m, which is the smallest size of NOR flash cell, for high density memory of mobile application. The operation of 0.049PM cell transistor is successfully achieved with three key technologies such as an optimized Self-Aligned Poly (SAP) structure with top corner rounding trench structure, a cell drain contact process by ArF photo lithographic tool, and a cell transistor with a gate length of 120nm.

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Key words

nanolithography

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