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Effects of film deposition rate and thermal annealing on optical and microstructural evolution of amorphous Ta/sub 2/O/sub 5/ and SiO/sub 2/ films

Wen-Jen Liu, Chia-Hung Chien

CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on Lasers and Electro-Optics (IEEE Cat. No.03TH8671)（2003）

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Abstract
The influences of deposition rate and thermal annealing for the surface roughness, optical properties, and microstructural evolution of single SiO/sub 2/ and Ta/sub 2/O/sub 5/ thin films on the D263T quartz glass substrate by using plasma ion assisted deposition (PIAD) were investigated.
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Key words
surface roughness,thin films,annealing
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