Evolution of Bottom c-Plane on Wet-Etched Patterned Sapphire Substrate
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY(2013)
摘要
Wet-etched pattern sapphire substrate (PSS) has been employed to improve the epitaxy of GaN-based LEDs. It was found that the crystal quality and performance of LEDs improved with decrease in c-plane areas of PSS. However, further decrease in bottom c-plane areas makes epitaxy of GaN film very difficult. In this research, the evolution of bottom c-plane was investigated through a systematic study. It was found that epitaxy difficulty might be due to the appearance of 6C facets {4 (1) over bar(3) over bar 18} and the disappearance of bottom c-plane. (C) 2013 The Electrochemical Society.
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关键词
substrate,wet-etched
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