Study Of Flux Ratio Of C-60 To Ar Cluster Ion For Hard Dlc Film Deposition

To study the influence of the flux ratio of C-60 molecule to Ar cluster ion on DLC film characteristics, DLC films deposited under various flux ratios were characterized with Raman spectrometry and Near Edge X-ray Absorption Fine Structure (NEXAFS). From results of these measurements, hard DLC films were deposited when the flux ratio of C-60 to Ar cluster ion was between 0.7 and 4. Furthermore the DLC film with constant sp(2) content was obtained in the range of the ratio from 0.7 to 4, which contents are lower values than that of conventional films such as RF plasma. DLC films deposited under the ratio from 1 to 4 had hardness from 40 to 45GPa. It was shown that DLC films with stable properties of low sp(2) content and high hardness were formed even when the fluxes were varied from 1 to 4 during deposition. It was indicated that this process was useful in the view of industrial application.