Scaling Of 32nm Low Power Sram With High-K Metal Gate

IEEE INTERNATIONAL ELECTRON DEVICES MEETING 2008, TECHNICAL DIGEST(2008)

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摘要
This paper describes SRAM scaling for 32nm low power bulk technology, enabled by high-K metal gate process, down to 0.149 mu m(2) and 0.124 mu m(2). SRAM access stability and write margin are significantly improved through a 50% Vt mismatch reduction, thanks to HK-MG T-inv scaling. Cell read current is increased by 70% over Poly-SiON process. Ultra dense cell process window is expanded with optimized contact process. A dual-ground write assist option can additionally enable ultra dense 0.124 mu m(2) cell to meet low power application requirements.
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关键词
leakage current,contact process,data mining,logic gates,high k metal gate
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