Smoothing properties of single and multilayer coatings: a method to smoothen substrates
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE)(2008)
摘要
In this work we present the smoothing properties of our ion beam smoothened multilayers and, based on the same technology, the extreme smoothing properties in the high and near mid spatial frequency range of a single-material smoothing layer. Coating results of high reflectance multilayers both on rough substrates and on substrates smoothened with silicon bufferlayers are discussed.
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关键词
Mo/Si multilayers,EUV lithography,roughness,smoothening
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