Smoothing properties of single and multilayer coatings: a method to smoothen substrates

PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE)(2008)

引用 0|浏览6
暂无评分
摘要
In this work we present the smoothing properties of our ion beam smoothened multilayers and, based on the same technology, the extreme smoothing properties in the high and near mid spatial frequency range of a single-material smoothing layer. Coating results of high reflectance multilayers both on rough substrates and on substrates smoothened with silicon bufferlayers are discussed.
更多
查看译文
关键词
Mo/Si multilayers,EUV lithography,roughness,smoothening
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要