Measurements of silicon dry-etching rates and profiles in MEMS foundries and their application to MEMS design software
SPIE ProceedingsDevice and Process Technologies for Microelectronics, MEMS, Photonics, and Nanotechnology IV(2007)
摘要
Deep reactive ion etching (DRIE) is an important tool in MEMS fabrication to achieve three-dimensional structures.
However, the etching profiles are not yet perfect. We had etching test samples fabricated in three MEMS foundries and
measured the etching rates, sidewall angles, mask selectivity, and sidewall roughness against the line and space of 2 to
5000 μm. We also performed similar DRIE processes using our system and compared our samples and the samples from
the foundries. The measurement results revealed the typical fabrication results in the MEMS foundries and their
differences. The data were included in the database of MemsONE, a newly developed MEMS design software, and can
be used for the process emulations.
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关键词
etching,microelectromechanical systems,fabrication,databases,dry etching,silicon,deep reactive ion etching
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