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Deep-UV microscopy based on a hybrid diffractive/refractive lens system

Robert J Brunner,Reinhard Steiner,Klaus Rudolf,Hansjurgen Dobschal,Renate Fechner,Axel Schindler

Frontiers in Optics 2004/Laser Science XXII/Diffractive Optics and Micro-Optics/Optical Fabrication and Testing（2004）

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Abstract
A hybrid microscope system was developed and used to inspect lithography-masks at 193 nm. The realization of the DOE as most critical element involves both, high frequency lithography and an additional ion etching process.
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microscopy,diffractive optics
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