Deep-UV microscopy based on a hybrid diffractive/refractive lens system
Frontiers in Optics 2004/Laser Science XXII/Diffractive Optics and Micro-Optics/Optical Fabrication and Testing(2004)
Abstract
A hybrid microscope system was developed and used to inspect lithography-masks at 193 nm. The realization of the DOE as most critical element involves both, high frequency lithography and an additional ion etching process.
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Key words
microscopy,diffractive optics
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