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排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
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Reflective Optical Element for the EUV Wavelength Range, Method for Producing and for Correcting Such an Element, Projection Lens for Microlithography Comprising Such an Element, and Projection Exposure Apparatus for Microlithography Comprising Such a Projection Lens

Markus Weiss,Norbert Kerwien, Martin Weiser,Boris Bittner,Norbert Wabra, Christoph Schlichenmaier, Wilfried Clauss

mag（2014）

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