Hardware Modifications to the US Army Research Laboratory's Metalorganic Chemical Vapor Deposition (MOCVD) System for Optimization of Complex Oxide Thin Film Fabrication
mag(2015)
关键词
measurement,chemical vapor deposition,x ray diffraction,lithography,thin films,optimization,scanning electron microscopy,homogeneity,chemical composition,fabrication,chemical reactors
AI 理解论文
溯源树
样例
![](https://originalfileserver.aminer.cn/sys/aminer/pubs/mrt_preview.jpeg)
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要