Regulating the uniformity of DLC films in ECR plasma with negative substrate biasing

Diamond-like carbon (DLC) films were deposited by electron cyclotron resonance plasma-chemical vapor deposition (ECR-CVD) at different substrate bias potential (Us = −200 and −800 V). The mechanical properties and microstructure uniformity of the DLC films deposited at different positions (the distance between substrate and ECR plasma source, Decr-s) were studied. The results showed that the ionization of acetylene (C2H2) at different positions decreased with the increase of Decr-s at substrate bias potential Us = −200 V. The plasma distribution was non-uniform, so the mechanical properties and structure of the DLC films varied a lot with the change of deposition position. At substrate bias potential Us = −800 V, an additional self-sustained discharge around the substrate could be generated during ECR plasma discharge, then the ionization of C2H2 and the plasma distribution uniformity at different positions were found to be improved. The uniformity of mechanical properties and structure of DLC films could be improved due to enhanced ionization of C2H2 in front of the substrate at high values of the negative substrate bias (Us = −800 V).