Spectral-purity-enhancing layer for multilayer mirrors.
OPTICS LETTERS(2008)
Abstract
We demonstrate, both theoretically and experimentally, that special spectral-purity-enhancing multilayer mirror systems can be designed and fabricated to substantially reduce the level of out-of-band radiation expected in an extreme ultraviolet lithographic tool. A first proof of principle of applying such spectral-purity-enhancement layers showed reduced out-of-band reflectance by a factor of five, while the in-band reflectance is only 4.5% (absolute) less than for a standard capped multilayer. (C) 2008 Optical Society of America.
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Key words
multilayer,spectral-purity-enhancing
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