Engineering the optical constants of sputtered amorphous silicon films by crystallization with rapid thermal annealing

Photonics Conference（2013）

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Abstract

We engineer the complex refractive index n+ik of sputtered amorphous silicon by rapid thermal annealing. An order-of-magnitude reduction of the extinction coefficient k is achieved.

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Key words

amorphous semiconductors,crystallisation,elemental semiconductors,extinction coefficients,rapid thermal annealing,refractive index,semiconductor thin films,silicon,sputtered coatings,si,complex refractive index,crystallization,extinction coefficient,optical constants,order-of-magnitude reduction,sputtered amorphous silicon films

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