How to improve the silicon nanocrystal memory cell performances for low power applications

CAS), 2012 International(2012)

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摘要
In this paper we propose to optimize the 1T silicon nanocrystal (Si-nc) memory cell in order to reduce the energy consumption for low power applications. Optimized Channel Hot Electron Injection (a 4.5V programming window is reached consuming 1nJ) and Fowler-Nordheim programming are analyzed and compared. The tunnel oxide thickness, Si-ncs area coverage and SiN silicon nanocrystals capping layer are adjusted to optimize the data retention and endurance criteria. We present for the first time the endurance characteristics of a Si-nc cell up to 106 cycles with a final programming window of 4V.
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关键词
elemental semiconductors,energy consumption,flash memories,hot carriers,low-power electronics,nanostructured materials,silicon,tunnelling,1t silicon nanocrystal memory cell performance,fowler-nordheim programming,si,data retention,endurance criteria,flash memory,low power application,nanocrystals capping layer,optimized channel hot electron injection,programming window,tunnel oxide thickness,voltage 4.5 v,silicon nanocrystal memories,low power electronics
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