Innovations In Special Constructs For Standard Cell Libraries In Sub 28nm Technologies

M. Rashed, N. Jain, J. Kim,M. Tarabbia, I. Rahim, S. Ahmed, Je Kim, I. Lin,S. Chan, H. Yoshida, S. Beasor,L. Yuan,J. Kye, J. Chee, A. Mittal, D. Doman, S. Johnson,U. Schroeder, N. Cave, T. Tang, J. Stephen,R. Augur,S. Kengeri,S. Venkatesan

Electron Devices Meeting(2013)

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摘要
In this paper, we have presented the need for Middle of Line (MOL) Local Interconnects in a fixed layout shape called "Special Constructs" in order to make 20nm a very compelling technology for product migration from 28nm. These constructs are used to demonstrate considerable area, cost, and power/performance benefits by enabling efficient and manufacturable high density standard cell libraries. Also, these constructs have become an essential elements of optical lithography based advanced CMOS nodes for cost effective technology scaling even beyond 20nm.
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关键词
cmos integrated circuits,photolithography,integrated circuit layout
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