Layer transfer of crystalline Si thin film by metal-assisted chemical etching concerning different H2O2/HF ratios

Photovoltaic Specialists Conference(2012)

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摘要
Thin-film crystalline photovoltaic (PV) cell is a trend for future PV with its potential to achieve low cost and high efficiency. Concerning material utilization efficiency, we propose a method with a fast manufacturing method of thin crystalline Si by chemical solution. To obtain the highest efficiency of material utilization, experiments with different H2O2/HF ratio are conducted, where related mechanisms are discussed. Moreover, large-area (87.7 mm2) thin film transferred to glass is demonstrated, and with embedded nanohole structure, lowest optical reflectance of 0.26% is measured. These characteristics show that the fabricated thin film has potential for large-area crystalline thin film PV.
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关键词
elemental semiconductors,etching,glass structure,hydrogen compounds,nanofabrication,photovoltaic cells,semiconductor thin films,silicon,H2O2-HF,Si,chemical solution,crystalline Si thin film,embedded nanohole structure,glass,layer transfer,manufacturing method,material utilization,metal-assisted chemical etching,optical reflectance,thin-film crystalline photovoltaic cell,crystalline materials,etching,nanostructured materials,optical reflection,photovoltaic cells,silicon,thin film devices
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