Reliability Characterization of 32nm High-K Metal Gate SOI Technology with Embedded DRAM
IEEE International Reliability Physics Symposium(2012)
Key words
High-K,Metal Gate,eDRAM,eFUSE,BTI,HCI,SHE,SER,SRAM,Self Heating
AI Read Science
Must-Reading Tree
Example

Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined