Negative effect of crystallization on the mechanism of laser damage in HfO2/SiO2 multilayer

Tateno, R.,Okada, H.,Otobe, T.,Kosuge, A.

Microopics Conference（2011）

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摘要

Elucidation for the mechanism of laser damage is indispensable to realize a high resistance mirror for the ultra-short pulse high intense lasers of the next generation. In this study, the surface and a section of a laser-damaged area of a laser mirror were observed with a laser microscope and a transmission electron microscope (cross-sectional TEM), respectively. A grain boundary of HfO2 microcrystal was observed in the damaged area. This observation, and an evaluation of the mirror's damage resistance showed that the formation of crystals in the multilayer mirror is one of the major determinants of damage resistance.

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关键词

crystallisation,hafnium compounds,high-speed optical techniques,laser beam effects,laser mirrors,optical multilayers,silicon compounds,transmission electron microscopy,HfO2-SiO2,cross-sectional TEM,crystallization,grain boundary,high intense lasers,high resistance mirror,laser damage,laser microscope,laser mirror,microcrystal,multilayer mirror,transmission electron microscope,ultra-short pulse lasers,

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