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Laser Scattering Microhaze Correlation with Polysilicon Surface Roughness and Impact on Electrical Performance

David K. Chen, Andy Steinbach,Matt Yeh,C. -C. Chen,S. -C. Chen,M. -S. Liang

IEEE International Symposium on Semiconductor Manufacturing conference proceedings(2006)

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CMOS integrated circuits,laser beam applications,semiconductor lasers,silicon,surface roughness,thin films,CMOS process,Si,electrical performance,laser scattering,microhaze correlation,polysilicon films,process tool monitoring,size 45 nm,surface maps,surface roughness,wafer surface information
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