Interaction of Light with Si Nanowire Films

Loucas Tsakalakos,Joleyn Balch,Jody Fronheiser,Min Yi Shih,S F Leboeuf,Matthew Pietrzykowski,Peter J Codella,Oleg V Sulima,J A Rand, Anil Kumar,B A Korevaar

Photovoltaic Energy Conversion, Conference Record of the 2006 IEEE 4th World Conference（2006）

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摘要

The optical properties of silicon nanowire films fabricated on bulk Si and glass substrates are reported. The total reflectance of aligned nanowire arrays formed by a wet etch process on bulk Si is lower than the control over all wavelengths below the bandgap, varying from ~1% at 300 nm to les 10% at 1,000 nm. Similar results are observed for nanowire thin films. The observed reflectance is related to the so-called "moth-eye" effect. Modeling work shows strong resonance of light within and between nanowires

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关键词

elemental semiconductors,etching,infrared spectra,nanotechnology,nanowires,semiconductor thin films,silicon,ultraviolet spectra,1000 nm,300 nm,na2o-cao-sio2,si,moth-eye effect,nanowire arrays,optical properties,silicon nanowire films fabrication,silicon substrates,soda-lime glass substrates,wet etch process,glass,solids,wet etching,thin film,reflectivity

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