On-wafer electrooptic probing using rotational deformation modulation
Photonics Technology Letters, IEEE（2000）
Abstract
On-wafer electrooptic probing of two-dimensional electric-field vector (E-vector) is demonstrated by using one laser beam and one electrooptic prober. This technique utilizes both compressed-stretched deformation and rotational deformation on the index ellipsoid of the electrooptic crystal. Both experiment and simulation were performed to map the E-vector on a circuit hoard, and the measurement error is within 2.2%.
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Key words
electro-optical devices,electro-optical modulation,integrated circuit testing,measurement errors,optical polarisers,optical sensors,polarimetry,probes,2D electric-field vector,E-vector,circuit board,compressed-stretched deformation,electrooptic crystal,index ellipsoid,measurement error,on-wafer electrooptic probing,rotational deformation,rotational deformation modulation,two-dimensional electric-field vector
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