Wavelength tuning of photonic crystal waveguides fabricated using 248-nm deep UV lithography

Yanxin Zhuang,Lars H Frandsen,A Harpoth,M Thorhauge,Martin Kristensen,P I Borel,Wim Bogaerts,Roel Baets

Optical Fiber Communication Conference, 2004. OFC 2004（2004）

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摘要

Wavelength tuning of characteristic features of straight photonic crystal waveguides has been obtained by varying the exposure dose in deep UV lithography. The experimental results agree very well with numerical simulations.

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关键词

integrated optics,numerical analysis,optical design techniques,optical fabrication,optical materials,optical tuning,optical waveguides,photonic crystals,ultraviolet lithography,248 nm,deep uv lithography,photonic crystal waveguide fabrication,wavelength tuning,numerical simulation,lithography,optical filters,tuning

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